2600 journal is the world's most advantageous magazine on desktop hacking and technological manipulation and regulate. released by means of hackers considering 1984, 2600 is a real window into the minds of a few of today's such a lot artistic and clever humans. The de facto voice of a brand new new release, this booklet has its finger at the pulse of the ever-changing electronic panorama. on hand for the 1st time in a electronic variation, 2600 keeps to convey special voices to an ever starting to be overseas neighborhood attracted to privateness matters, machine defense, and the electronic underground.
This factor contains:
A personal home page Rootkit Case Study
Denial of carrier 2.0
Spoofing MAC Addresses on Windows
GroupMe: a latest method of Social Engineering
Curiosity Killed the Cat
Stupid 9-Volt Tricks
So... i purchased a Chromebook
Hacking Giveaway of the Day
How to prevent the net courting Scam
Domain and Security
Towards a Hacker pleasant cellular World
LinuxLive... retailer Me
The significant Flaw of Pentesting
Free tune: the hunt for the MP3
An EMP Flash - all of it Stops
Learning from Stratfor: Extracting a Salt from an MD5 Hash
Control4 and residential Automation
Backdooring with Metasploit
My Grandpa's Books by no means More!
Insurgent know-how: In WikiLeaks' Wake
The execs and Cons of Courses
Read Online or Download 2600 Magazine: The Hacker Quarterly (Spring 2012) PDF
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Extra resources for 2600 Magazine: The Hacker Quarterly (Spring 2012)
6 ITRS 2000 update. 3 V? 3 V ?? ITRS 2000 update. 35 Others could be realized by conventional way. 2 V? 34 Lithography is critical. 85 V) ITRS 2000 vs. Intel 2000. become different and some of the devices will not reach the downsizing limit for a long time. Even if we reach the downsizing limit, we have still many things to do for integration of the devices in multi-chip mode, as shown in Figs. 39. For deep twenty-first century, still the device and hardware technology will be important, as shown in Fig.
Dig. , pp. 174–175, June, 2000. 15. R. Chau, J. Kavalieros, B. Roberds, R. Schenker, D. Lionberger, D. Barlage, B. Doyle, R. Arghavani, A. Murthy, and G. 7 ps p-MOS gate delays,” IEDM Tech. , pp. 45–49, December, 2000. 16. E. Leobandung, E. Barth, M. -H. Lo, R. Schulz, W. Chu, M. Khare, D. Sadana, D. Schepis, R. Bolam, J. Sleight, F. White, F. Assaderaghi, D. Moy, G. Biery, R. -C. Chen, B. Davari, and G. Shahidi, “High Performance 0,18 µm SOI CMOS Technology,” IEDM Tech. , pp. 679–682, December, 1999.
The solid curve in the figure is Lg versus tox relation according to the ITRS 2000 . It should be noted that most of the published MOSFETs maintain the scaling relationship between Lg and tox predicted by ITRS 2000. 19 are Vd versus Lg, and Id (or Ion) versus Lg curves, respectively obtained from the published data at the conferences. 17 Trend of Tox. © 2002 by CRC Press LLC Toshiba’ 94 :outside of ITRS spec. : almost within ITRS spec. 18 Trend of Vdd. 1 Intel’99 (IEDM99) 100 10−1 2 ITRS’99 (plan) NEC’99 (EJ-MOSFET) (SSDM99) : with ITRS scaling parameters : thicker gate insulator than ITRS 1980 1990 2000 Year 2010 2020 2030 Trend of drain current.